As part of university core facilities, LPL houses an FEI Helios NanoLab 660 focused-ion-beam scanning-electron microscope (FIB-SEM). The Helios is equipped with an Elstar electron gun and monochromator and is capable of electron beam resolution down to 0.6 nm from 15 kV to 2kV. Its Tomahawk Ga+ ion column can be operated between 65 nA and 500 V for, respectively, removal of large volumes of material and final sample polishing. Under standard operating conditions, an ion beam resolution 2.5 nm at 30 kV is achievable. The Helios is equipped with in situ micromanipulation for creation and transfer of lamellae for TEM analysis. It is also equipped with an EDAX Energy Dispersive Spectroscopy (EDS) and Electron Backscatter Diffraction (EBSD) analysis system for compositional and crystallographic analysis in two and three dimensions. Multiple polygons are supported for device patterning as well as the ability to directly import customized shapes via BMP files for patterning or deposition. The Helios is equipped with C and Pt gas-injection systems.